Helium Ion Beam Lithography on Fullerene Molecular Resists for Sub-10 nm Patterning
نویسندگان
چکیده
Xiaoqing Shi , Philip Prewett , Ejaz Huq , Darren M Bagnall , Alex P G Robinson, Stuart A Boden , a Electronics and Computer Science, University of Southampton, Southampton, SO16 1BJ, UK b Oxford Scientific Consultants Ltd., 67 High Street, Dorchester, Oxfordshire, OX10 7HN, UK c Faculty of Engineering, The University of New South Wales 3, Sydney, NSW 2052, Australia d School of Chemical Engineering, University of Birmingham, Birmingham, B15 2TT, UK e-mail: [email protected]
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تاریخ انتشار 2015